High-K/Metal Gate images
Computer Desktop Encyclopedia THIS DEFINITION IS FOR PERSONAL USE ONLY. All other reproduction is strictly prohibited without permission from the publisher.Copyright © 1981-2010 by Computer Language Company Inc. All rights reserved.
Electrode and Dielectric
When the gate is pulsed, current flows between the source and drain. Intel's High-K/Metal Gate technology enabled elements on a chip to be reduced to 45 nm with stability. SiGe stands for silicon germanium. (Bottom image courtesy of Intel Corporation.)
Computer Desktop Encyclopedia THIS DEFINITION IS FOR PERSONAL USE ONLY. All other reproduction is strictly prohibited without permission from the publisher.Copyright © 1981-2010 by Computer Language Company Inc. All rights reserved.
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